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High performance tools for rigorous precision applications
of macro, micro, and deep sub-micron mask design.
OPAL
- Graphical Layout Editor
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Extremely Fast and Flexible
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Unlimited database size
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Extensive hierarchical data manipulation - up to 32 levels
deep
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Unlimited number of structures
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Multi-window editing of cells in any orientation or in-context
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Up to 127 layers of data
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Supports arcs, circles, all angle geometries
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Unlimited number of complex boundary vertices
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Various other complex functions built-in, including:
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Oversize & Undersize Biasing
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Easy detection and removal of coincident and collinear
vertices
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Polygon "Cut & Heal"
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Polygon "Knife Cut"
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Multiple parallel trace generation
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Spirals
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Filleting
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"FlatFix" creates hierarchy from flat data
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User programmable "C" command language for custom functions
and macros - ONYX
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Full three mouse button functionality
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User customizable pop-up menus can be activated anywhere
on the screen
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Easy to edit ASCII (CIF like) database
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Seamless integration into our other Building Blocks of
your Complete Design Environment
JADE
- Fast Interactive Layout Verification
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Distributed processing across your entire network
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Multi-Faceted operation
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optimized for parallel execution across a TCP/IP network
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requires less disk space - only 10 to 15 MB
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dramatically cuts run times
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Unlimited chip size
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Runs existing DraculaTM
run control files
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All angle database optimized for horizontal, vertical,
and diagonals
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Extremely low disk storage requirements
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All angle Boolean operations - AND, NOT, OR, XOR
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Three types of sizing/biasing
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All types of dimensional checks, including width, spacing,
notch, length and area, with rule conjunction for complex errors
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Powerful selection and classification operators
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Automatic error reporting
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HV/LLC Modules available for
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Hierarchical Verification analysis and extraction of FLAT
or HIERARCHICAL netlists
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Logic and Layout Comparison of multiple databases
for DEVICES and NETS
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Electrical Rules Checking - ERC
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Layout Parameter Analysis - LPA
RUBY
- Manufacturing Interface
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Inputs:
GDSII
Stream,
CIF,
MEBES,
Mann
PG, Applicon APL860,
DXF,
Gerber RS-274-X/F9000,
EDIF
(soon)
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Outputs:
GDSII
Stream,
CIF,
MEBES,
DXF,
Gerber RS-274-X/F9000,
EDIF
(soon)
JPS
- Postscript plot output for hardcopy layout verification
The International Phototool Company
is proud to represent Fletcher Automation and this outstanding design
package. Among the applications for which these tools have been very
successfully used since 1986 include:
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Analog & Digital Chips
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Bipolar, NMOS, CMOS & GaAs Chips
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Hybrid's
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ASIC's
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VLSI & ULSI Circuits
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Monolithic Microwave Integrated Circuits (MMIC's)
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Thin and thick film hybrids
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Microwave circuits
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Semiconductor packaging
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Multichip modules (MCM's)
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Microelectromechanical systems (MEMS)
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Encoders
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NBS gauges
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Flat Panel Displays
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Medical components
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Photochemical Machining (PCM)
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Many other types of 2D mechanical or electro-mechanical
designs
We now have PcOpal!
This exceedingly versatile package runs on all flavors of Windows (except Win3.x).
It can also be ported to the Solaris fairly upon request.
What more could you ask for?
CLICK HERE
to request more information, or for a free demo.
Click HERE to go to the International
Phototool Company HOME PAGE.
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